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This machine combines both immersion cleaning and ultrasonic technology with the functionality of a conveyor system. In this process, objects or components to be cleaned are loaded onto the conveyor system. These objects may be parts or items used in manufacturing processes, and they often have various types of contaminants on their surfaces. The conveyor system then moves the loaded objects into the immersion tank. As the objects enter the tank, they are completely submerged in the cleaning solution. While submerged, ultrasonic transducers emit high-frequency sound waves into the cleaning solution. After the ultrasonic cleaning stage, the conveyor system may transport the objects to a rinsing stage where they are sprayed with clean water or a rinsing solution to remove any remaining cleaning solution or residues. In some systems, a drying stage is included. It may involve the use of hot air or other drying methods to remove residual moisture from the cleaned objects before they exit the conveyor system. Conveyor washer systems can be customized to accommodate specific cleaning needs, including choice of cleaning solution, conveyor speed, and temperature control. Immersion ultrasonic conveyor washers are commonly used in manufacturing industries, such as automotive, aerospace, electronics, and precision engineering, where precise and efficient cleaning of components is crucial to the quality of the final products. Features: o Precision Industrial Cleaning o Fully Customised o Multiple Stages Technical Specifications: o Precision Industrial Cleaning o Fully Customised o Multiple Stages

Wafer ultrasonic cleaners are specifically designed to clean individual semiconductor wafers one at a time. This single-wafer approach ensures that each wafer is cleaned with precision. These cleaners predominantly use water-based cleaning solutions or solvents that are compatible with the materials used in semiconductor fabrication. The choice of solution may vary depending on the type of contaminants to be removed. Most of our systems are fully automated and include handling mechanisms to transport wafers from loading to cleaning, rinsing, and drying stages, minimizing human contact and potential contamination. These cleaners are designed to remove submicron particles and nanometer-level residues, crucial for semiconductor manufacturing where even minuscule contaminants can lead to defects. The cleaning process ensures that wafers have particle-free surfaces, which is essential for lithography and other semiconductor fabrication steps. Features: o Fully Automated Systems o Minimum Human Interference o Usage of handling mechanisms Technical Specifications: o Brand: Waveultra o Power Output (Ultrasonic): 1 kW o Total Volume / Capacity: 64 Litres o Heater Power: 1 kW o Power Input: 230V AC o Frequency: 40 / 68 kHz o Material: SS304/SS316/PP o Basket Size(L x W x H): 350 x 350 x 300 mm o Transducers: PZT type o Temperature Controller: Upto 60oc o Cleaning Agent: Water based solution / Solvent o Tank Size (L x W x H): 400 x 400 x 400 mm o No. of Stages: Multiple o Optional Stages: Rinsing / Pickling / Hot Air Drying