'microbial contamination'

Hot air ovens are commonly used in laboratory settings in conjunction with ultrasonic cleaners to facilitate the cleaning and drying process of laboratory equipment and glassware. Ultrasonic cleaners are highly effective at removing contaminants from laboratory equipment and glassware. However, they often leave objects wet after cleaning. Hot air ovens help complete the cleaning process by thoroughly drying the objects, preventing the formation of water spots or residues. Hot air ovens can also serve as sterilization chambers. After ultrasonic cleaning, placing objects in the hot air oven at specific temperatures for a set duration can ensure that laboratory equipment and glassware are free from microbial contamination, contributing to the reliability of experiments and research. The combination of ultrasonic cleaners and hot air ovens is particularly valuable in laboratory settings where precision, cleanliness, and reliability are paramount. Features: o Removes moisture o Highly Precise o Adjustable temperature controller Technical Specifications: o Brand: Waveultra o Power Input: 230V AC o Temperature Range: 10˚c to 200˚c o Temperature Controller Type: Digital o Material: MS Powder Coated o Internal Size(L x W x H): 400 x 400 x 400 mm o Placement Tray: 2

Our dental ultrasonic cleaners are designed to be compatible with a range of dental instruments and materials, including stainless steel, dental tools, mirrors, and removable dental appliances. These systems primarily use water-based cleaning solutions or specialized dental-grade detergents and disinfectants, ensuring the removal of contaminants and microbial residues. Dental ultrasonic cleaners are effective at both cleaning and disinfecting dental instruments, ensuring that they meet the highest hygiene and sterilization standards. Dental professionals can adjust cleaning parameters and select appropriate detergents or disinfectants to meet specific dental hygiene and sterilization requirements. Features: o Precision Cleaning o Highly Effective o Suitable for all dental apparatus Technical Specifications: o Brand: Waveultra o Power Output (Ultrasonic): 300 W o Total Volume / Capacity: 15 Litres o Heater Power: 500 W o Power Input: 230V AC o Frequency: 40 kHz o Material: SS304 o Basket Size(L x W x H): 250 x 200 x 150 mm o Transducers: PZT type o Temperature Controller: Upto 60oc o Cleaning Agent: Water based solution / Enzyme Solution o Tank Size (L x W x H): 300 x 250 x 200 mm

Wafer ultrasonic cleaners are specifically designed to clean individual semiconductor wafers one at a time. This single-wafer approach ensures that each wafer is cleaned with precision. These cleaners predominantly use water-based cleaning solutions or solvents that are compatible with the materials used in semiconductor fabrication. The choice of solution may vary depending on the type of contaminants to be removed. Most of our systems are fully automated and include handling mechanisms to transport wafers from loading to cleaning, rinsing, and drying stages, minimizing human contact and potential contamination. These cleaners are designed to remove submicron particles and nanometer-level residues, crucial for semiconductor manufacturing where even minuscule contaminants can lead to defects. The cleaning process ensures that wafers have particle-free surfaces, which is essential for lithography and other semiconductor fabrication steps. Features: o Fully Automated Systems o Minimum Human Interference o Usage of handling mechanisms Technical Specifications: o Brand: Waveultra o Power Output (Ultrasonic): 1 kW o Total Volume / Capacity: 64 Litres o Heater Power: 1 kW o Power Input: 230V AC o Frequency: 40 / 68 kHz o Material: SS304/SS316/PP o Basket Size(L x W x H): 350 x 350 x 300 mm o Transducers: PZT type o Temperature Controller: Upto 60oc o Cleaning Agent: Water based solution / Solvent o Tank Size (L x W x H): 400 x 400 x 400 mm o No. of Stages: Multiple o Optional Stages: Rinsing / Pickling / Hot Air Drying