'handling mechanisms'

Wafer ultrasonic cleaners are specifically designed to clean individual semiconductor wafers one at a time. This single-wafer approach ensures that each wafer is cleaned with precision. These cleaners predominantly use water-based cleaning solutions or solvents that are compatible with the materials used in semiconductor fabrication. The choice of solution may vary depending on the type of contaminants to be removed. Most of our systems are fully automated and include handling mechanisms to transport wafers from loading to cleaning, rinsing, and drying stages, minimizing human contact and potential contamination. These cleaners are designed to remove submicron particles and nanometer-level residues, crucial for semiconductor manufacturing where even minuscule contaminants can lead to defects. The cleaning process ensures that wafers have particle-free surfaces, which is essential for lithography and other semiconductor fabrication steps. Features: o Fully Automated Systems o Minimum Human Interference o Usage of handling mechanisms Technical Specifications: o Brand: Waveultra o Power Output (Ultrasonic): 1 kW o Total Volume / Capacity: 64 Litres o Heater Power: 1 kW o Power Input: 230V AC o Frequency: 40 / 68 kHz o Material: SS304/SS316/PP o Basket Size(L x W x H): 350 x 350 x 300 mm o Transducers: PZT type o Temperature Controller: Upto 60oc o Cleaning Agent: Water based solution / Solvent o Tank Size (L x W x H): 400 x 400 x 400 mm o No. of Stages: Multiple o Optional Stages: Rinsing / Pickling / Hot Air Drying

Waveultra’s multi-stage rinsing and drying ultrasonic cleaner is a specialized cleaning system that combines ultrasonic technology with sequential stages for thorough cleaning, rinsing, and drying of items or components. These cleaners incorporate drying mechanisms, such as hot air blowers, vacuum drying, or evaporation, to ensure that items are thoroughly dried before they are removed from the system. These cleaners offer consistent cleaning, rinsing, and drying results in each cycle, important for applications where consistency is crucial, such as medical equipment or precision components. The controlled process ensures that items or components are cleaned, rinsed, and dried without causing damage or corrosion, preserving their structural integrity. Features: o Sequential Stages o Includes Rinsing and Drying process o Consistent Results Technical Specifications: o Brand: Waveultra o Power Output (Ultrasonic): 2 kW o Total Volume / Capacity: 120 Litres o Heater Power: 2 kW o Power Input: 230V AC o Frequency: 27 / 40 / 68 kHz o Material: SS304 o Basket Size(L x W x H): 550 x 350 x 350 mm o Transducers: PZT type o Temperature Controller: Upto 60oc o Cleaning Agent: Water based solution / Solvent o Tank Size (L x W x H): 600 x 400 x 400 mm o Filtration: 10 Micron (Optional) o No. of Stages: Multiple o Optional Stages: High-pressure Jet / Rinsing / Hot Air Drying

These types of cleaners are commonly used in industries and applications where both ultrasonic and vacuum processes are required to achieve thorough and precise cleaning. These cleaners are also equipped with a vacuum system, typically integrated with the ultrasonic cleaning tank. The vacuum system removes air and gases from the cleaning chamber, creating a vacuum environment. To create a vacuum environment, these cleaners have sealing mechanisms to ensure an airtight seal during the vacuum process. Features: o State-of-the-art cleaning o Highly Reliable o Temperature Controller Technical Specs: o Brand: Waveultra o Power Output (Ultrasonic): 2 kW o Total Volume / Capacity: 120 Litres o Heater Power: 2 kW o Power Input: 415V (3 Phase) o Frequency: 27 / 40 / 68 kHz o Material: SS304 o Basket Size(L x W x H): 550 x 450 x 350 mm o Transducers: PZT type o Temperature Controller: Upto 60oc o Cleaning Agent: Water based solution / Solvent o Tank Size (L x W x H): 600 x 500 x 400 mm o Filtration: 10 Micron (Optional)